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阴极溅射法
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阴极溅射法
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阴极溅射法
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cathode sputtering
阴极溅射法
固体靶中的原子被高能量离子(通常来自等离子体)撞击而离开固体进入气体的物理气相沉积技术。又称溅镀。
Chemistry
>无机化学>固体化学>释义
cathode sputtering method
阴极溅射法
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