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钽靶材
释义
钽靶材
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工学
钽
释
tantalum target
钽靶材
通过磁控溅射等物理气相沉积法或其他镀膜方法在适当工艺条件下溅射在基板上形成各种功能薄膜的溅射源。是钽薄膜制备过程中高速荷能粒子轰击的目标钽材料。
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redundant arrays of independent disks
redundant arrays of independent disks, RAID
redundant axiom
redundant circuit
redundant code
redundant coordinate
redundant device
redundant digit
redundant DNA
redundant-DOF mechanism
redundant equation
redundant hologram
redundant information
redundant memory
redundant multi-threading
redundant number
redundant observation
redundant prepuce
redundant representation
redundant syllable in rhyme tables
redundant system
red vanadium
red variable
Red vial del Tahuantinsuyo
Red Volta
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