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钽靶材
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钽靶材
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tantalum target
钽靶材
通过磁控溅射等物理气相沉积法或其他镀膜方法在适当工艺条件下溅射在基板上形成各种功能薄膜的溅射源。是钽薄膜制备过程中高速荷能粒子轰击的目标钽材料。
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non-ferrous metal electrometallurgical machinery
nonferrous-metallic mineral resources
non-ferrous metal pyrogenic process smelting machinery
nonferrous metals
nonferrous metals industry
nonferrous metals industry in the world
non-ferrous metal slag
nonferrous smelting flue gas
non-Fick effect
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non-film radiographic non-destructive testing
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non-formaldehyde thermoplastic resin plywood
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non-Fredholm integral equation
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