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聚焦离子束光刻
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聚焦离子束光刻
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磁致动器
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focused ion beam lithography
聚焦离子束光刻
在聚焦离子束技术基础上将原子离化后形成离子束的能量控制在10~200千电子伏特,在工件表面采用直接扫描、掩模曝光或者投影曝光加工微细线条图案,制备微纳器件的工艺。
Physics
>光学>纳米光学和超快光学>释义
focus ion beam milling
聚焦离子束光刻
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system estimation
system evaluation
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system expandability
system failure of power system
system fault diagnosis
system fault tolerance
system fault tolerance, SFT
system feasibility
system feedback
system flow diagram
system flux
system follow-up
system for buildings with animals
system for buildings with plants
system for stockpiling reserves of major commodities
system for the review of constitutionality
system function
system generated electromagnetic pulse
system generation
system ground
system hazard analysis
system high security
systemic acquired resistance
systemic action of pesticide
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