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晕环注入
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晕环注入
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离子注入工艺
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halo implant
晕环注入
在集成电路制造中,通过大角度倾斜注入(largeangle tiled implant,LATI)与衬底相同类型的掺杂离子,在源漏区和衬底之间形成晕环(Halo)结构高掺杂区的技术。
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