“光刻曝光工艺”的概念、定义、翻译、参考文献-科学参考

单词	光刻曝光工艺
释义	光刻曝光工艺 Encyclopedia 工学光刻技术释 lithography exposure process光刻曝光工艺集成电路制造中，将掩膜上的几何图形转移到涂覆在基片表面的光刻胶中的技术。
随便看	simultaneous equations model simultaneous estimation simultaneous events simultaneous exploration of coal and uranium simultaneous exploration of oil and potash simultaneous exploration of oil and uranium simultaneous fault simultaneous fermentation simultaneous game simultaneous homogeneous approximation simultaneous inequalities simultaneous inference simultaneous integral equations simultaneous interpreting simultaneous interval estimation simultaneous invariants simultaneous iteration simultaneous leaching simultaneous linear congruences simultaneous linear equations simultaneous localization and mapping simultaneously satisfiable simultaneous masking simultaneous multiplane imaging simultaneous multiple surface design method

科学参考收录了854744条科技类词条，基本涵盖了常见科技类参考文献及英语词汇的翻译，是科学学习和研究的有利工具。